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A Review: Breakdown Voltage Enhancement of GaN Semiconductors Based High Electron Mobility Transistors     
Yazarlar
Doç. Dr. Osman ÇİÇEK Doç. Dr. Osman ÇİÇEK
Kastamonu Üniversitesi, Türkiye
Yosef Badali
Istanbul Ticaret Üniversitesi, Turkey
Özet
Gallium Nitride (GaN) based High Electron Mobility Transistors (HEMTs) are regarded as fundamental semiconductor devices for future power electronic applications. Consequently, researchers have directed their efforts toward enhancing critical parameters such as the breakdown voltage (Vbr), cut-off frequency, and operating temperature. Therefore, this review article explores research endeavors concerning the enhancement of Vbr in GaN-based HEMTs. The objective is to gain insights into the key factors influencing Vbr values and to identify the constraints that govern the optimal performance of HEMTs in power devices. Additionally, this review provides an in-depth examination of select studies that introduce novel techniques for improving Vbr values.
Anahtar Kelimeler
Breakdown Voltage Enhancement | Electric breakdown | Electric fields | Field-Plated Structure | GaN | HEMTs | HEMTs | III-V semiconductor materials | Logic gates | Negative-Bias Temperature Instability | Passivation | Passivation Layer | Transistors | Wide-bandgap
Makale Türü Özgün Makale
Makale Alt Türü SSCI, AHCI, SCI, SCI-Exp dergilerinde yayımlanan tam makale
Dergi Adı IEEE Transactions on Device and Materials Reliability
Dergi ISSN 1530-4388
Dergi Grubu Q2
Makale Dili İngilizce
Basım Tarihi 01-2024
Cilt No 24
Sayı 1
Sayfalar 275 / 286
Doi Numarası 10.1109/TDMR.2024.3379745